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3 kV ion source Packed

A 3 kV ion source sputter package that comprises an electron discharge source, power supply, and cable
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DGC IV

DGC IV for reading the pressure with a nude gauge DGCIII available again
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Ion gun G2

The Model 04-165 Backfill Ion Source generates an energetic inert gas ion beam for sputter- etching solid surfaces. The source requires a static pressure of 5x10-5 torr with an inert gas such as argon (see datasheet for list of compatible gasses)
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ion gun nti

ion gun nti for sputtering
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PC147 Upgrade for older Physical electronics systeme

Windows software upgrade for PHI systems Includes: RBD 147 System Interface, AS XPS Option, cable kits, installation instructions, 2 hours telephone and/or WebEx installation support Not inclu
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uCMA

Compact and affordable, the ╬╝CMA opens up a whole new world of possibilities for AES analysis including small vacuum experiments, in-situ analysis in MBE and deposition chambers, and silicon wafer or solar film in-line surface analysis.
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UVB 100

The UVB-100 is a cost-efectve way to increase your productvity b vapor removal easier and faster, giving you more time for additon runs or other tasks.
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PC147 Upgrade for older Physical electronics systeme

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PC147 Upgrade for older Physical electronics systeme

Windows software upgrade for PHI systems Includes: RBD 147 System Interface, AS XPS Option, cable kits, installation instructions, 2 hours telephone and/or WebEx installation support Not inclu

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